Pall Highlights Contamination Control and Water Reclaim Technologies at Intersolar North America 2011

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Jul 05, 2011, 11:00 ET

PORT WASHINGTON, N.Y., July 5, 2011 /PRNewswire/ -- Pall Corporation (NYSE: PLL), a global leader in filtration, separation and purification, will showcase a new silane gas purification system and other contamination control products for the photovoltaic (PV) industry at Intersolar North America in San Francisco. The products are designed to help increase yield and reduce cost of ownership in solar cell manufacturing.

Purification of the process gases utilized in solar cell production is critical to enhancing yields and conversion efficiency. Pall will introduce the Gaskleen® PG44000 purification system, developed for the removal of moisture, siloxanes and trace metal dopants to sub-ppb levels from bulk silane gas. An integrated filter provides exceptional particle removal efficiency. The system can operate at 27.5 MPa / 3,000 psi and can be designed for up to 4,000 L/min, making it most suitable for polysilicon and silicon manufacturing. Smaller, point-of-use, silane purifiers containing the same AresKleen™ SIP medium are also available for amorphous silicon PV cell manufacturing.

"The point-of-use Maxi Gaskleen purifier with SIP material was evaluated by CVD Equipment Corporation and was found to lower dopant metal contaminants (As, P, Al and B) in a low grade silane line, resulting in improved silicon-epitaxial layers with impurities in the parts per trillion atomic (ppta) range," said Karlheinz Strobl, VP of business development, CVD Equipment Corporation. "We, therefore, find the Pall purifier to be eminently capable of achieving below ppb levels of these contaminants in hydrogen, argon and silane process gases utilized in silane epitaxial film deposition."

On display will be Gaskleen purifier assemblies with AresKleen HCLP medium, which has proven highly effective in removing trace moisture to < 15 parts per billion (ppb) from HCl gas, used in the formation of trichlorosilane, also a key ingredient in the production of polysilicon.

Pall will also present its fully automatic Water Reclaim System for recovering over 90% of deionized water used during silicon ingot shaping. The system efficiently and economically removes the resultant silicon fines without the need for chemical additives, providing essentially particle-free water for cost-effective recycling. A major supplier of shaping and grinding tools for the solar industry highly recommends this reclaim system.

Another exhibit will highlight Blowback Filtration Systems for the protection of CZ ingot puller vacuum pumps. Furthermore, these automated systems featuring highly efficient, porous stainless steel filters are essential where argon recycling is being considered.

A display of innovative filters and uniquely designed housings for chemical and water filtration will round out Pall's showcase at Intersolar North America. The systems and products provide long-term service without the interruption of frequent change-outs, increasing uptime and reducing maintenance costs for solar cell producers.

For more information, visit: www.pall.com/microe_46695.asp. Visit the Pall booth at Intersolar North America: #9039, West Hall Level 3, at the Moscone Center in San Francisco from July 12 – 14, 2011.

About Pall Corporation

Pall Corporation (NYSE: PLL) is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The Company's engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation, with total revenues of $2.4 billion for fiscal 2010, is an S&P 500 company with more than 10,000 employees serving customers worldwide. To see how Pall is helping enable a greener, safer, more sustainable future, follow us on Twitter @PallCorporation or visit www.pall.com/green.

SOURCE Pall Corporation